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Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires
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Zeitschriftentitel: | Nano Letters |
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Personen und Körperschaften: | , , , , , |
In: | Nano Letters, 17, 2017, 7, S. 4502-4507 |
Format: | E-Article |
Sprache: | Englisch |
veröffentlicht: |
American Chemical Society (ACS)
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Schlagwörter: |
author_facet |
Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. |
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author |
Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. |
spellingShingle |
Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. Nano Letters Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires Mechanical Engineering Condensed Matter Physics General Materials Science General Chemistry Bioengineering |
author_sort |
ozel, tuncay |
spelling |
Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. 1530-6984 1530-6992 American Chemical Society (ACS) Mechanical Engineering Condensed Matter Physics General Materials Science General Chemistry Bioengineering http://dx.doi.org/10.1021/acs.nanolett.7b01950 Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires Nano Letters |
doi_str_mv |
10.1021/acs.nanolett.7b01950 |
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American Chemical Society (ACS) |
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Nano Letters |
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title |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_unstemmed |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_full |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_fullStr |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_full_unstemmed |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_short |
Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_sort |
electrochemical deposition of conformal and functional layers on high aspect ratio silicon micro/nanowires |
topic |
Mechanical Engineering Condensed Matter Physics General Materials Science General Chemistry Bioengineering |
url |
http://dx.doi.org/10.1021/acs.nanolett.7b01950 |
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2017 |
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4502-4507 |
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author | Ozel, Tuncay, Zhang, Benjamin A., Gao, Ruixuan, Day, Robert W., Lieber, Charles M., Nocera, Daniel G. |
author_facet | Ozel, Tuncay, Zhang, Benjamin A., Gao, Ruixuan, Day, Robert W., Lieber, Charles M., Nocera, Daniel G., Ozel, Tuncay, Zhang, Benjamin A., Gao, Ruixuan, Day, Robert W., Lieber, Charles M., Nocera, Daniel G. |
author_sort | ozel, tuncay |
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doi_str_mv | 10.1021/acs.nanolett.7b01950 |
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imprint | American Chemical Society (ACS), 2017 |
imprint_str_mv | American Chemical Society (ACS), 2017 |
institution | DE-Zi4, DE-15, DE-105, DE-14, DE-Ch1 |
issn | 1530-6984, 1530-6992 |
issn_str_mv | 1530-6984, 1530-6992 |
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match_str | ozel2017electrochemicaldepositionofconformalandfunctionallayersonhighaspectratiosiliconmicronanowires |
mega_collection | American Chemical Society (ACS) (CrossRef) |
physical | 4502-4507 |
publishDate | 2017 |
publishDateSort | 2017 |
publisher | American Chemical Society (ACS) |
record_format | ai |
recordtype | ai |
series | Nano Letters |
source_id | 49 |
spelling | Ozel, Tuncay Zhang, Benjamin A. Gao, Ruixuan Day, Robert W. Lieber, Charles M. Nocera, Daniel G. 1530-6984 1530-6992 American Chemical Society (ACS) Mechanical Engineering Condensed Matter Physics General Materials Science General Chemistry Bioengineering http://dx.doi.org/10.1021/acs.nanolett.7b01950 Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires Nano Letters |
spellingShingle | Ozel, Tuncay, Zhang, Benjamin A., Gao, Ruixuan, Day, Robert W., Lieber, Charles M., Nocera, Daniel G., Nano Letters, Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires, Mechanical Engineering, Condensed Matter Physics, General Materials Science, General Chemistry, Bioengineering |
title | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_full | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_fullStr | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_full_unstemmed | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_short | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
title_sort | electrochemical deposition of conformal and functional layers on high aspect ratio silicon micro/nanowires |
title_unstemmed | Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires |
topic | Mechanical Engineering, Condensed Matter Physics, General Materials Science, General Chemistry, Bioengineering |
url | http://dx.doi.org/10.1021/acs.nanolett.7b01950 |