@article{ ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTAyMS9hY3MubmFub2xldHQuN2IwMTk1MA, title = {Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires}, journal = {Nano Letters}, volume = {17}, number = {7}, pages = {4502-4507}, author = {Ozel, Tuncay and Zhang, Benjamin A. and Gao, Ruixuan and Day, Robert W. and Lieber, Charles M. and Nocera, Daniel G.}, publisher = {American Chemical Society (ACS)}, year = {2017}, issn = {1530-6984}, issn = {1530-6992}, language = {English}, url = {http://dx.doi.org/10.1021/acs.nanolett.7b01950}, url = {https://katalog.hszg.de/Record/ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTAyMS9hY3MubmFub2xldHQuN2IwMTk1MA} }