author_facet Becker, JöRg D.
Zeindl, Hans P.
Eisele, Ignaz
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Zeindl, Hans P.
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author Becker, JöRg D.
Zeindl, Hans P.
Eisele, Ignaz
spellingShingle Becker, JöRg D.
Zeindl, Hans P.
Eisele, Ignaz
Physik in unserer Zeit
Nanometer‐Schichten in Silizium
General Economics, Econometrics and Finance
author_sort becker, jörg d.
spelling Becker, JöRg D. Zeindl, Hans P. Eisele, Ignaz 0031-9252 1521-3943 Wiley General Economics, Econometrics and Finance http://dx.doi.org/10.1002/piuz.19900210602 <jats:title>Abstract</jats:title><jats:p>Die Molekularstrahlepitaxie erlaubt die Herstellung einkristalliner, hochdotierter Schichtfolgen im Nanometerbereich in Silizium. Dies ist der erste Schritt zur dreidimensionalen Hochintegration.</jats:p> Nanometer‐Schichten in Silizium Physik in unserer Zeit
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title Nanometer‐Schichten in Silizium
title_unstemmed Nanometer‐Schichten in Silizium
title_full Nanometer‐Schichten in Silizium
title_fullStr Nanometer‐Schichten in Silizium
title_full_unstemmed Nanometer‐Schichten in Silizium
title_short Nanometer‐Schichten in Silizium
title_sort nanometer‐schichten in silizium
topic General Economics, Econometrics and Finance
url http://dx.doi.org/10.1002/piuz.19900210602
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physical 245-251
description <jats:title>Abstract</jats:title><jats:p>Die Molekularstrahlepitaxie erlaubt die Herstellung einkristalliner, hochdotierter Schichtfolgen im Nanometerbereich in Silizium. Dies ist der erste Schritt zur dreidimensionalen Hochintegration.</jats:p>
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author Becker, JöRg D., Zeindl, Hans P., Eisele, Ignaz
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description <jats:title>Abstract</jats:title><jats:p>Die Molekularstrahlepitaxie erlaubt die Herstellung einkristalliner, hochdotierter Schichtfolgen im Nanometerbereich in Silizium. Dies ist der erste Schritt zur dreidimensionalen Hochintegration.</jats:p>
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spelling Becker, JöRg D. Zeindl, Hans P. Eisele, Ignaz 0031-9252 1521-3943 Wiley General Economics, Econometrics and Finance http://dx.doi.org/10.1002/piuz.19900210602 <jats:title>Abstract</jats:title><jats:p>Die Molekularstrahlepitaxie erlaubt die Herstellung einkristalliner, hochdotierter Schichtfolgen im Nanometerbereich in Silizium. Dies ist der erste Schritt zur dreidimensionalen Hochintegration.</jats:p> Nanometer‐Schichten in Silizium Physik in unserer Zeit
spellingShingle Becker, JöRg D., Zeindl, Hans P., Eisele, Ignaz, Physik in unserer Zeit, Nanometer‐Schichten in Silizium, General Economics, Econometrics and Finance
title Nanometer‐Schichten in Silizium
title_full Nanometer‐Schichten in Silizium
title_fullStr Nanometer‐Schichten in Silizium
title_full_unstemmed Nanometer‐Schichten in Silizium
title_short Nanometer‐Schichten in Silizium
title_sort nanometer‐schichten in silizium
title_unstemmed Nanometer‐Schichten in Silizium
topic General Economics, Econometrics and Finance
url http://dx.doi.org/10.1002/piuz.19900210602