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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition
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Journal Title: | Philosophical Magazine B |
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In: | Philosophical Magazine B, 77, 1998, 4, p. 925-944 |
Type of Resource: | E-Article |
Language: | Undetermined |
published: |
Informa UK Limited
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