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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition
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| Zeitschriftentitel: | Philosophical Magazine B |
|---|---|
| Personen und Körperschaften: | |
| In: | Philosophical Magazine B, 77, 1998, 4, S. 925-944 |
| Format: | E-Article |
| Sprache: | Unbestimmt |
| veröffentlicht: |
Informa UK Limited
|
| Schlagwörter: |
| author_facet |
Giorgis, F. Giuliani, C. F. Pirri,, F. Giorgis, F. Giuliani, C. F. Pirri,, F. |
|---|---|
| author |
Giorgis, F. Giuliani, C. F. Pirri,, F. |
| spellingShingle |
Giorgis, F. Giuliani, C. F. Pirri,, F. Philosophical Magazine B Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition General Physics and Astronomy General Chemical Engineering |
| author_sort |
giorgis, f. giuliani, c. f. pirri,, f. |
| spelling |
Giorgis, F. Giuliani, C. F. Pirri,, F. 1364-2812 1463-6417 Informa UK Limited General Physics and Astronomy General Chemical Engineering http://dx.doi.org/10.1080/014186398259013 Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition Philosophical Magazine B |
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Informa UK Limited, 1998 |
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| title |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_unstemmed |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_full |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_fullStr |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_full_unstemmed |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_short |
Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_sort |
optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| topic |
General Physics and Astronomy General Chemical Engineering |
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http://dx.doi.org/10.1080/014186398259013 |
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1998 |
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| institution | DE-D161, DE-Gla1, DE-Zi4, DE-15, DE-Pl11, DE-Rs1, DE-105, DE-14, DE-Ch1, DE-L229, DE-D275, DE-Bn3, DE-Brt1 |
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| series | Philosophical Magazine B |
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| spelling | Giorgis, F. Giuliani, C. F. Pirri,, F. 1364-2812 1463-6417 Informa UK Limited General Physics and Astronomy General Chemical Engineering http://dx.doi.org/10.1080/014186398259013 Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition Philosophical Magazine B |
| spellingShingle | Giorgis, F. Giuliani, C. F. Pirri,, F., Philosophical Magazine B, Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition, General Physics and Astronomy, General Chemical Engineering |
| title | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_full | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_fullStr | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_full_unstemmed | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_short | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_sort | optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| title_unstemmed | Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition |
| topic | General Physics and Astronomy, General Chemical Engineering |
| url | http://dx.doi.org/10.1080/014186398259013 |