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Measurement of the redistribution of arsenic at nickel silicide/silicon interface by secondary ion mass spectrometry: artifact and optimized analysis conditions
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Journal Title: | Journal of Applied Physics |
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Authors and Corporations: | , , , , |
In: | Journal of Applied Physics, 104, 2008, 2 |
Type of Resource: | E-Article |
Language: | English |
published: |
AIP Publishing
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Subjects: |