Further processing options
Novel annealing scheme for fabricating high-quality Ti-silicided shallow n+p junction by P+ implantation into thin Ti films on Si substrate
Saved in:
Journal Title: | Applied Physics Letters |
---|---|
Authors and Corporations: | , |
In: | Applied Physics Letters, 60, 1992, 13, p. 1579-1581 |
Type of Resource: | E-Article |
Language: | English |
published: |
AIP Publishing
|
Subjects: |