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Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation
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| Zeitschriftentitel: | Advanced Materials Research |
|---|---|
| Personen und Körperschaften: | |
| In: | Advanced Materials Research, 634-638, 2013, S. 2458-2461 |
| Format: | E-Article |
| Sprache: | Unbestimmt |
| veröffentlicht: |
Trans Tech Publications, Ltd.
|
| Schlagwörter: |
| author_facet |
Lv, Jing Lv, Jing |
|---|---|
| author |
Lv, Jing |
| spellingShingle |
Lv, Jing Advanced Materials Research Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation General Engineering |
| author_sort |
lv, jing |
| spelling |
Lv, Jing 1662-8985 Trans Tech Publications, Ltd. General Engineering http://dx.doi.org/10.4028/www.scientific.net/amr.634-638.2458 <jats:p>Al films were prepared on quartz substrates by thermal evaporation. The effects of annealing in air on structure and optical and electrical properties have been studied. It is found that the annealing in air will affect on structure and morphology of the films, which results in the difference in the optical and electrical properties. The as-deposited film is amorphous, the films annealed at 200 and 400oC are polycrystalline. After annealed at 600oC, the film was oxidized and changed to porous γ-Al2O3. The film annealed at 200 oC has the maximum reflectance and at 400 oC has the minimum resistivity in all samples. While for the film annealed at 600 oC, the resistivity is close to be infinite, the reflectance is the minimum at wavelength ranging from 400 to 800 nm in all the samples.</jats:p> Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation Advanced Materials Research |
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Trans Tech Publications, Ltd., 2013 |
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Trans Tech Publications, Ltd., 2013 |
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1662-8985 |
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1662-8985 |
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2013 |
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Trans Tech Publications, Ltd. |
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Advanced Materials Research |
| source_id |
49 |
| title |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_unstemmed |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_full |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_fullStr |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_full_unstemmed |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_short |
Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_sort |
effects of annealing in air on structure and properties of al films prepared by thermal evaporation |
| topic |
General Engineering |
| url |
http://dx.doi.org/10.4028/www.scientific.net/amr.634-638.2458 |
| publishDate |
2013 |
| physical |
2458-2461 |
| description |
<jats:p>Al films were prepared on quartz substrates by thermal evaporation. The effects of annealing in air on structure and optical and electrical properties have been studied. It is found that the annealing in air will affect on structure and morphology of the films, which results in the difference in the optical and electrical properties. The as-deposited film is amorphous, the films annealed at 200 and 400oC are polycrystalline. After annealed at 600oC, the film was oxidized and changed to porous γ-Al2O3. The film annealed at 200 oC has the maximum reflectance and at 400 oC has the minimum resistivity in all samples. While for the film annealed at 600 oC, the resistivity is close to be infinite, the reflectance is the minimum at wavelength ranging from 400 to 800 nm in all the samples.</jats:p> |
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| container_title | Advanced Materials Research |
| container_volume | 634-638 |
| description | <jats:p>Al films were prepared on quartz substrates by thermal evaporation. The effects of annealing in air on structure and optical and electrical properties have been studied. It is found that the annealing in air will affect on structure and morphology of the films, which results in the difference in the optical and electrical properties. The as-deposited film is amorphous, the films annealed at 200 and 400oC are polycrystalline. After annealed at 600oC, the film was oxidized and changed to porous γ-Al2O3. The film annealed at 200 oC has the maximum reflectance and at 400 oC has the minimum resistivity in all samples. While for the film annealed at 600 oC, the resistivity is close to be infinite, the reflectance is the minimum at wavelength ranging from 400 to 800 nm in all the samples.</jats:p> |
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| imprint_str_mv | Trans Tech Publications, Ltd., 2013 |
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| physical | 2458-2461 |
| publishDate | 2013 |
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| publisher | Trans Tech Publications, Ltd. |
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| recordtype | ai |
| series | Advanced Materials Research |
| source_id | 49 |
| spelling | Lv, Jing 1662-8985 Trans Tech Publications, Ltd. General Engineering http://dx.doi.org/10.4028/www.scientific.net/amr.634-638.2458 <jats:p>Al films were prepared on quartz substrates by thermal evaporation. The effects of annealing in air on structure and optical and electrical properties have been studied. It is found that the annealing in air will affect on structure and morphology of the films, which results in the difference in the optical and electrical properties. The as-deposited film is amorphous, the films annealed at 200 and 400oC are polycrystalline. After annealed at 600oC, the film was oxidized and changed to porous γ-Al2O3. The film annealed at 200 oC has the maximum reflectance and at 400 oC has the minimum resistivity in all samples. While for the film annealed at 600 oC, the resistivity is close to be infinite, the reflectance is the minimum at wavelength ranging from 400 to 800 nm in all the samples.</jats:p> Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation Advanced Materials Research |
| spellingShingle | Lv, Jing, Advanced Materials Research, Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation, General Engineering |
| title | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_full | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_fullStr | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_full_unstemmed | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_short | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| title_sort | effects of annealing in air on structure and properties of al films prepared by thermal evaporation |
| title_unstemmed | Effects of Annealing in Air on Structure and Properties of Al Films Prepared by Thermal Evaporation |
| topic | General Engineering |
| url | http://dx.doi.org/10.4028/www.scientific.net/amr.634-638.2458 |