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Dark-field electron holography as a recording of crystal diffraction in real space: a comparative study with high-resolution X-ray diffraction for strain analysis of MOSFETs
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Journal Title: | Journal of Applied Crystallography |
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Authors and Corporations: | , , , , , , , , |
In: | Journal of Applied Crystallography, 53, 2020, 4, p. 885-895 |
Type of Resource: | E-Article |
Language: | Undetermined |
published: |
International Union of Crystallography (IUCr)
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Subjects: |