author_facet Sharma, P. A.
Brumbach, M.
Adams, D. P.
Ihlefeld, J. F.
Lima-Sharma, A. L.
Chou, S.
Sugar, J. D.
Lu, P.
Michael, J. R.
Ingersoll, D.
Sharma, P. A.
Brumbach, M.
Adams, D. P.
Ihlefeld, J. F.
Lima-Sharma, A. L.
Chou, S.
Sugar, J. D.
Lu, P.
Michael, J. R.
Ingersoll, D.
author Sharma, P. A.
Brumbach, M.
Adams, D. P.
Ihlefeld, J. F.
Lima-Sharma, A. L.
Chou, S.
Sugar, J. D.
Lu, P.
Michael, J. R.
Ingersoll, D.
spellingShingle Sharma, P. A.
Brumbach, M.
Adams, D. P.
Ihlefeld, J. F.
Lima-Sharma, A. L.
Chou, S.
Sugar, J. D.
Lu, P.
Michael, J. R.
Ingersoll, D.
AIP Advances
Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
General Physics and Astronomy
author_sort sharma, p. a.
spelling Sharma, P. A. Brumbach, M. Adams, D. P. Ihlefeld, J. F. Lima-Sharma, A. L. Chou, S. Sugar, J. D. Lu, P. Michael, J. R. Ingersoll, D. 2158-3226 AIP Publishing General Physics and Astronomy http://dx.doi.org/10.1063/1.5081818 <jats:p>Uniform metal contacts are critical for advanced thermoelectric devices. The uniformity of the contact resistance for gold, tungsten, and SrRuO3 electrodes on polycrystalline ternary Bi2Te3-based alloys for different types of surface cleaning procedures was characterized. The presence of a nanometer-thick native oxide layer on the Bi2Te3 surface leads to large and non-uniform contact resistance. Surface treatments included solvent cleans and chemical and dry etching prior to metallization of the Bi2Te3. Only etching the surface led to a significant improvement in contact resistance uniformity. None of the tested contacts reacted with the underlying Bi2Te3 substrate. Etching resulted in the removal of the native oxide on the Bi2Te3 surface, which was characterized using X-ray photoelectron spectroscopy (XPS). The average thickness, chemistry, and dry etch rate of the native oxide was further characterized using XPS. The non-uniformity in contact resistance suggests that the native oxide grows non-uniformly on polycrystalline bismuth telluride surfaces.</jats:p> Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys AIP Advances
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title Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_unstemmed Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_full Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_fullStr Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_full_unstemmed Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_short Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_sort electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
topic General Physics and Astronomy
url http://dx.doi.org/10.1063/1.5081818
publishDate 2019
physical
description <jats:p>Uniform metal contacts are critical for advanced thermoelectric devices. The uniformity of the contact resistance for gold, tungsten, and SrRuO3 electrodes on polycrystalline ternary Bi2Te3-based alloys for different types of surface cleaning procedures was characterized. The presence of a nanometer-thick native oxide layer on the Bi2Te3 surface leads to large and non-uniform contact resistance. Surface treatments included solvent cleans and chemical and dry etching prior to metallization of the Bi2Te3. Only etching the surface led to a significant improvement in contact resistance uniformity. None of the tested contacts reacted with the underlying Bi2Te3 substrate. Etching resulted in the removal of the native oxide on the Bi2Te3 surface, which was characterized using X-ray photoelectron spectroscopy (XPS). The average thickness, chemistry, and dry etch rate of the native oxide was further characterized using XPS. The non-uniformity in contact resistance suggests that the native oxide grows non-uniformly on polycrystalline bismuth telluride surfaces.</jats:p>
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author Sharma, P. A., Brumbach, M., Adams, D. P., Ihlefeld, J. F., Lima-Sharma, A. L., Chou, S., Sugar, J. D., Lu, P., Michael, J. R., Ingersoll, D.
author_facet Sharma, P. A., Brumbach, M., Adams, D. P., Ihlefeld, J. F., Lima-Sharma, A. L., Chou, S., Sugar, J. D., Lu, P., Michael, J. R., Ingersoll, D., Sharma, P. A., Brumbach, M., Adams, D. P., Ihlefeld, J. F., Lima-Sharma, A. L., Chou, S., Sugar, J. D., Lu, P., Michael, J. R., Ingersoll, D.
author_sort sharma, p. a.
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description <jats:p>Uniform metal contacts are critical for advanced thermoelectric devices. The uniformity of the contact resistance for gold, tungsten, and SrRuO3 electrodes on polycrystalline ternary Bi2Te3-based alloys for different types of surface cleaning procedures was characterized. The presence of a nanometer-thick native oxide layer on the Bi2Te3 surface leads to large and non-uniform contact resistance. Surface treatments included solvent cleans and chemical and dry etching prior to metallization of the Bi2Te3. Only etching the surface led to a significant improvement in contact resistance uniformity. None of the tested contacts reacted with the underlying Bi2Te3 substrate. Etching resulted in the removal of the native oxide on the Bi2Te3 surface, which was characterized using X-ray photoelectron spectroscopy (XPS). The average thickness, chemistry, and dry etch rate of the native oxide was further characterized using XPS. The non-uniformity in contact resistance suggests that the native oxide grows non-uniformly on polycrystalline bismuth telluride surfaces.</jats:p>
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spelling Sharma, P. A. Brumbach, M. Adams, D. P. Ihlefeld, J. F. Lima-Sharma, A. L. Chou, S. Sugar, J. D. Lu, P. Michael, J. R. Ingersoll, D. 2158-3226 AIP Publishing General Physics and Astronomy http://dx.doi.org/10.1063/1.5081818 <jats:p>Uniform metal contacts are critical for advanced thermoelectric devices. The uniformity of the contact resistance for gold, tungsten, and SrRuO3 electrodes on polycrystalline ternary Bi2Te3-based alloys for different types of surface cleaning procedures was characterized. The presence of a nanometer-thick native oxide layer on the Bi2Te3 surface leads to large and non-uniform contact resistance. Surface treatments included solvent cleans and chemical and dry etching prior to metallization of the Bi2Te3. Only etching the surface led to a significant improvement in contact resistance uniformity. None of the tested contacts reacted with the underlying Bi2Te3 substrate. Etching resulted in the removal of the native oxide on the Bi2Te3 surface, which was characterized using X-ray photoelectron spectroscopy (XPS). The average thickness, chemistry, and dry etch rate of the native oxide was further characterized using XPS. The non-uniformity in contact resistance suggests that the native oxide grows non-uniformly on polycrystalline bismuth telluride surfaces.</jats:p> Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys AIP Advances
spellingShingle Sharma, P. A., Brumbach, M., Adams, D. P., Ihlefeld, J. F., Lima-Sharma, A. L., Chou, S., Sugar, J. D., Lu, P., Michael, J. R., Ingersoll, D., AIP Advances, Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys, General Physics and Astronomy
title Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_full Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_fullStr Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_full_unstemmed Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_short Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_sort electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
title_unstemmed Electrical contact uniformity and surface oxidation of ternary chalcogenide alloys
topic General Physics and Astronomy
url http://dx.doi.org/10.1063/1.5081818