Eintrag weiter verarbeiten
Technique for junction depth measurement of silicon solar cells
Gespeichert in:
Zeitschriftentitel: | Review of Scientific Instruments |
---|---|
Personen und Körperschaften: | , |
In: | Review of Scientific Instruments, 54, 1983, 11, S. 1580-1582 |
Format: | E-Article |
Sprache: | Englisch |
veröffentlicht: |
AIP Publishing
|
Schlagwörter: |
author_facet |
Biswas, D. Roy, J. B. Biswas, D. Roy, J. B. |
---|---|
author |
Biswas, D. Roy, J. B. |
spellingShingle |
Biswas, D. Roy, J. B. Review of Scientific Instruments Technique for junction depth measurement of silicon solar cells Instrumentation |
author_sort |
biswas, d. |
spelling |
Biswas, D. Roy, J. B. 0034-6748 1089-7623 AIP Publishing Instrumentation http://dx.doi.org/10.1063/1.1137270 <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> Technique for junction depth measurement of silicon solar cells Review of Scientific Instruments |
doi_str_mv |
10.1063/1.1137270 |
facet_avail |
Online |
finc_class_facet |
Allgemeines Technik |
format |
ElectronicArticle |
fullrecord |
blob:ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjExMzcyNzA |
id |
ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjExMzcyNzA |
institution |
DE-Ch1 DE-L229 DE-D275 DE-Bn3 DE-Brt1 DE-D161 DE-Gla1 DE-Zi4 DE-15 DE-Pl11 DE-Rs1 DE-105 DE-14 |
imprint |
AIP Publishing, 1983 |
imprint_str_mv |
AIP Publishing, 1983 |
issn |
0034-6748 1089-7623 |
issn_str_mv |
0034-6748 1089-7623 |
language |
English |
mega_collection |
AIP Publishing (CrossRef) |
match_str |
biswas1983techniqueforjunctiondepthmeasurementofsiliconsolarcells |
publishDateSort |
1983 |
publisher |
AIP Publishing |
recordtype |
ai |
record_format |
ai |
series |
Review of Scientific Instruments |
source_id |
49 |
title |
Technique for junction depth measurement of silicon solar cells |
title_unstemmed |
Technique for junction depth measurement of silicon solar cells |
title_full |
Technique for junction depth measurement of silicon solar cells |
title_fullStr |
Technique for junction depth measurement of silicon solar cells |
title_full_unstemmed |
Technique for junction depth measurement of silicon solar cells |
title_short |
Technique for junction depth measurement of silicon solar cells |
title_sort |
technique for junction depth measurement of silicon solar cells |
topic |
Instrumentation |
url |
http://dx.doi.org/10.1063/1.1137270 |
publishDate |
1983 |
physical |
1580-1582 |
description |
<jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> |
container_issue |
11 |
container_start_page |
1580 |
container_title |
Review of Scientific Instruments |
container_volume |
54 |
format_de105 |
Article, E-Article |
format_de14 |
Article, E-Article |
format_de15 |
Article, E-Article |
format_de520 |
Article, E-Article |
format_de540 |
Article, E-Article |
format_dech1 |
Article, E-Article |
format_ded117 |
Article, E-Article |
format_degla1 |
E-Article |
format_del152 |
Buch |
format_del189 |
Article, E-Article |
format_dezi4 |
Article |
format_dezwi2 |
Article, E-Article |
format_finc |
Article, E-Article |
format_nrw |
Article, E-Article |
_version_ |
1792347434316201991 |
geogr_code |
not assigned |
last_indexed |
2024-03-01T17:55:13.988Z |
geogr_code_person |
not assigned |
openURL |
url_ver=Z39.88-2004&ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fvufind.svn.sourceforge.net%3Agenerator&rft.title=Technique+for+junction+depth+measurement+of+silicon+solar+cells&rft.date=1983-11-01&genre=article&issn=1089-7623&volume=54&issue=11&spage=1580&epage=1582&pages=1580-1582&jtitle=Review+of+Scientific+Instruments&atitle=Technique+for+junction+depth+measurement+of+silicon+solar+cells&aulast=Roy&aufirst=J.+B.&rft_id=info%3Adoi%2F10.1063%2F1.1137270&rft.language%5B0%5D=eng |
SOLR | |
_version_ | 1792347434316201991 |
author | Biswas, D., Roy, J. B. |
author_facet | Biswas, D., Roy, J. B., Biswas, D., Roy, J. B. |
author_sort | biswas, d. |
container_issue | 11 |
container_start_page | 1580 |
container_title | Review of Scientific Instruments |
container_volume | 54 |
description | <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> |
doi_str_mv | 10.1063/1.1137270 |
facet_avail | Online |
finc_class_facet | Allgemeines, Technik |
format | ElectronicArticle |
format_de105 | Article, E-Article |
format_de14 | Article, E-Article |
format_de15 | Article, E-Article |
format_de520 | Article, E-Article |
format_de540 | Article, E-Article |
format_dech1 | Article, E-Article |
format_ded117 | Article, E-Article |
format_degla1 | E-Article |
format_del152 | Buch |
format_del189 | Article, E-Article |
format_dezi4 | Article |
format_dezwi2 | Article, E-Article |
format_finc | Article, E-Article |
format_nrw | Article, E-Article |
geogr_code | not assigned |
geogr_code_person | not assigned |
id | ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjExMzcyNzA |
imprint | AIP Publishing, 1983 |
imprint_str_mv | AIP Publishing, 1983 |
institution | DE-Ch1, DE-L229, DE-D275, DE-Bn3, DE-Brt1, DE-D161, DE-Gla1, DE-Zi4, DE-15, DE-Pl11, DE-Rs1, DE-105, DE-14 |
issn | 0034-6748, 1089-7623 |
issn_str_mv | 0034-6748, 1089-7623 |
language | English |
last_indexed | 2024-03-01T17:55:13.988Z |
match_str | biswas1983techniqueforjunctiondepthmeasurementofsiliconsolarcells |
mega_collection | AIP Publishing (CrossRef) |
physical | 1580-1582 |
publishDate | 1983 |
publishDateSort | 1983 |
publisher | AIP Publishing |
record_format | ai |
recordtype | ai |
series | Review of Scientific Instruments |
source_id | 49 |
spelling | Biswas, D. Roy, J. B. 0034-6748 1089-7623 AIP Publishing Instrumentation http://dx.doi.org/10.1063/1.1137270 <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> Technique for junction depth measurement of silicon solar cells Review of Scientific Instruments |
spellingShingle | Biswas, D., Roy, J. B., Review of Scientific Instruments, Technique for junction depth measurement of silicon solar cells, Instrumentation |
title | Technique for junction depth measurement of silicon solar cells |
title_full | Technique for junction depth measurement of silicon solar cells |
title_fullStr | Technique for junction depth measurement of silicon solar cells |
title_full_unstemmed | Technique for junction depth measurement of silicon solar cells |
title_short | Technique for junction depth measurement of silicon solar cells |
title_sort | technique for junction depth measurement of silicon solar cells |
title_unstemmed | Technique for junction depth measurement of silicon solar cells |
topic | Instrumentation |
url | http://dx.doi.org/10.1063/1.1137270 |