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Roy, J. B.
Biswas, D.
Roy, J. B.
author Biswas, D.
Roy, J. B.
spellingShingle Biswas, D.
Roy, J. B.
Review of Scientific Instruments
Technique for junction depth measurement of silicon solar cells
Instrumentation
author_sort biswas, d.
spelling Biswas, D. Roy, J. B. 0034-6748 1089-7623 AIP Publishing Instrumentation http://dx.doi.org/10.1063/1.1137270 <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> Technique for junction depth measurement of silicon solar cells Review of Scientific Instruments
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title Technique for junction depth measurement of silicon solar cells
title_unstemmed Technique for junction depth measurement of silicon solar cells
title_full Technique for junction depth measurement of silicon solar cells
title_fullStr Technique for junction depth measurement of silicon solar cells
title_full_unstemmed Technique for junction depth measurement of silicon solar cells
title_short Technique for junction depth measurement of silicon solar cells
title_sort technique for junction depth measurement of silicon solar cells
topic Instrumentation
url http://dx.doi.org/10.1063/1.1137270
publishDate 1983
physical 1580-1582
description <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p>
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author Biswas, D., Roy, J. B.
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description <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p>
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spelling Biswas, D. Roy, J. B. 0034-6748 1089-7623 AIP Publishing Instrumentation http://dx.doi.org/10.1063/1.1137270 <jats:p>A new technique for junction depth measurements of silicon solar cells is described. The technique essentially consists of repeated anodization and etching of the surface layer followed by electrical measurements. The advantages of the technique are discussed and illustrative results are presented.</jats:p> Technique for junction depth measurement of silicon solar cells Review of Scientific Instruments
spellingShingle Biswas, D., Roy, J. B., Review of Scientific Instruments, Technique for junction depth measurement of silicon solar cells, Instrumentation
title Technique for junction depth measurement of silicon solar cells
title_full Technique for junction depth measurement of silicon solar cells
title_fullStr Technique for junction depth measurement of silicon solar cells
title_full_unstemmed Technique for junction depth measurement of silicon solar cells
title_short Technique for junction depth measurement of silicon solar cells
title_sort technique for junction depth measurement of silicon solar cells
title_unstemmed Technique for junction depth measurement of silicon solar cells
topic Instrumentation
url http://dx.doi.org/10.1063/1.1137270