author_facet Liao, M. H.
Chen, M.-J.
Chen, T. C.
Wang, P.-L.
Liu, C. W.
Liao, M. H.
Chen, M.-J.
Chen, T. C.
Wang, P.-L.
Liu, C. W.
author Liao, M. H.
Chen, M.-J.
Chen, T. C.
Wang, P.-L.
Liu, C. W.
spellingShingle Liao, M. H.
Chen, M.-J.
Chen, T. C.
Wang, P.-L.
Liu, C. W.
Applied Physics Letters
Electroluminescence from metal/oxide/strained-Si tunneling diodes
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spelling Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. 0003-6951 1077-3118 AIP Publishing Physics and Astronomy (miscellaneous) http://dx.doi.org/10.1063/1.1937989 <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> Electroluminescence from metal/oxide/strained-Si tunneling diodes Applied Physics Letters
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title Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_unstemmed Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_full Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_fullStr Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_full_unstemmed Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_short Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_sort electroluminescence from metal/oxide/strained-si tunneling diodes
topic Physics and Astronomy (miscellaneous)
url http://dx.doi.org/10.1063/1.1937989
publishDate 2005
physical
description <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p>
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author Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W.
author_facet Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W., Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W.
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container_title Applied Physics Letters
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description <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p>
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spelling Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. 0003-6951 1077-3118 AIP Publishing Physics and Astronomy (miscellaneous) http://dx.doi.org/10.1063/1.1937989 <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> Electroluminescence from metal/oxide/strained-Si tunneling diodes Applied Physics Letters
spellingShingle Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W., Applied Physics Letters, Electroluminescence from metal/oxide/strained-Si tunneling diodes, Physics and Astronomy (miscellaneous)
title Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_full Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_fullStr Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_full_unstemmed Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_short Electroluminescence from metal/oxide/strained-Si tunneling diodes
title_sort electroluminescence from metal/oxide/strained-si tunneling diodes
title_unstemmed Electroluminescence from metal/oxide/strained-Si tunneling diodes
topic Physics and Astronomy (miscellaneous)
url http://dx.doi.org/10.1063/1.1937989