Eintrag weiter verarbeiten
Electroluminescence from metal/oxide/strained-Si tunneling diodes
Gespeichert in:
Zeitschriftentitel: | Applied Physics Letters |
---|---|
Personen und Körperschaften: | , , , , |
In: | Applied Physics Letters, 86, 2005, 22 |
Format: | E-Article |
Sprache: | Englisch |
veröffentlicht: |
AIP Publishing
|
Schlagwörter: |
author_facet |
Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. |
---|---|
author |
Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. |
spellingShingle |
Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. Applied Physics Letters Electroluminescence from metal/oxide/strained-Si tunneling diodes Physics and Astronomy (miscellaneous) |
author_sort |
liao, m. h. |
spelling |
Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. 0003-6951 1077-3118 AIP Publishing Physics and Astronomy (miscellaneous) http://dx.doi.org/10.1063/1.1937989 <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> Electroluminescence from metal/oxide/strained-Si tunneling diodes Applied Physics Letters |
doi_str_mv |
10.1063/1.1937989 |
facet_avail |
Online |
finc_class_facet |
Physik |
format |
ElectronicArticle |
fullrecord |
blob:ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjE5Mzc5ODk |
id |
ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjE5Mzc5ODk |
institution |
DE-Gla1 DE-Zi4 DE-15 DE-Pl11 DE-Rs1 DE-105 DE-14 DE-Ch1 DE-L229 DE-D275 DE-Bn3 DE-Brt1 DE-D161 |
imprint |
AIP Publishing, 2005 |
imprint_str_mv |
AIP Publishing, 2005 |
issn |
0003-6951 1077-3118 |
issn_str_mv |
0003-6951 1077-3118 |
language |
English |
mega_collection |
AIP Publishing (CrossRef) |
match_str |
liao2005electroluminescencefrommetaloxidestrainedsitunnelingdiodes |
publishDateSort |
2005 |
publisher |
AIP Publishing |
recordtype |
ai |
record_format |
ai |
series |
Applied Physics Letters |
source_id |
49 |
title |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_unstemmed |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_full |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_fullStr |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_full_unstemmed |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_short |
Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_sort |
electroluminescence from metal/oxide/strained-si tunneling diodes |
topic |
Physics and Astronomy (miscellaneous) |
url |
http://dx.doi.org/10.1063/1.1937989 |
publishDate |
2005 |
physical |
|
description |
<jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> |
container_issue |
22 |
container_start_page |
0 |
container_title |
Applied Physics Letters |
container_volume |
86 |
format_de105 |
Article, E-Article |
format_de14 |
Article, E-Article |
format_de15 |
Article, E-Article |
format_de520 |
Article, E-Article |
format_de540 |
Article, E-Article |
format_dech1 |
Article, E-Article |
format_ded117 |
Article, E-Article |
format_degla1 |
E-Article |
format_del152 |
Buch |
format_del189 |
Article, E-Article |
format_dezi4 |
Article |
format_dezwi2 |
Article, E-Article |
format_finc |
Article, E-Article |
format_nrw |
Article, E-Article |
_version_ |
1792333411579330562 |
geogr_code |
not assigned |
last_indexed |
2024-03-01T14:12:19.782Z |
geogr_code_person |
not assigned |
openURL |
url_ver=Z39.88-2004&ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fvufind.svn.sourceforge.net%3Agenerator&rft.title=Electroluminescence+from+metal%2Foxide%2Fstrained-Si+tunneling+diodes&rft.date=2005-05-30&genre=article&issn=1077-3118&volume=86&issue=22&jtitle=Applied+Physics+Letters&atitle=Electroluminescence+from+metal%2Foxide%2Fstrained-Si+tunneling+diodes&aulast=Liu&aufirst=C.+W.&rft_id=info%3Adoi%2F10.1063%2F1.1937989&rft.language%5B0%5D=eng |
SOLR | |
_version_ | 1792333411579330562 |
author | Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W. |
author_facet | Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W., Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W. |
author_sort | liao, m. h. |
container_issue | 22 |
container_start_page | 0 |
container_title | Applied Physics Letters |
container_volume | 86 |
description | <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> |
doi_str_mv | 10.1063/1.1937989 |
facet_avail | Online |
finc_class_facet | Physik |
format | ElectronicArticle |
format_de105 | Article, E-Article |
format_de14 | Article, E-Article |
format_de15 | Article, E-Article |
format_de520 | Article, E-Article |
format_de540 | Article, E-Article |
format_dech1 | Article, E-Article |
format_ded117 | Article, E-Article |
format_degla1 | E-Article |
format_del152 | Buch |
format_del189 | Article, E-Article |
format_dezi4 | Article |
format_dezwi2 | Article, E-Article |
format_finc | Article, E-Article |
format_nrw | Article, E-Article |
geogr_code | not assigned |
geogr_code_person | not assigned |
id | ai-49-aHR0cDovL2R4LmRvaS5vcmcvMTAuMTA2My8xLjE5Mzc5ODk |
imprint | AIP Publishing, 2005 |
imprint_str_mv | AIP Publishing, 2005 |
institution | DE-Gla1, DE-Zi4, DE-15, DE-Pl11, DE-Rs1, DE-105, DE-14, DE-Ch1, DE-L229, DE-D275, DE-Bn3, DE-Brt1, DE-D161 |
issn | 0003-6951, 1077-3118 |
issn_str_mv | 0003-6951, 1077-3118 |
language | English |
last_indexed | 2024-03-01T14:12:19.782Z |
match_str | liao2005electroluminescencefrommetaloxidestrainedsitunnelingdiodes |
mega_collection | AIP Publishing (CrossRef) |
physical | |
publishDate | 2005 |
publishDateSort | 2005 |
publisher | AIP Publishing |
record_format | ai |
recordtype | ai |
series | Applied Physics Letters |
source_id | 49 |
spelling | Liao, M. H. Chen, M.-J. Chen, T. C. Wang, P.-L. Liu, C. W. 0003-6951 1077-3118 AIP Publishing Physics and Astronomy (miscellaneous) http://dx.doi.org/10.1063/1.1937989 <jats:p>The metal-oxide-silicon light-emitting diode under biaxial tensile mechanical strain is studied. The emission line shape of the device can be fitted by the electron-hole-plasma recombination model. The energy gap of strained Si extracted by the light emission spectra at the temperature of 120 K is reduced by 15 meV under 0.13% biaxial tensile strain. The light intensity of the device under 0.13% biaxial tensile strain increases 9% as compared to the relaxed-Si device. The upshift of valence band edge under mechanical strain to increase the majority hole concentration at the oxide∕Si interface may be responsible for this light emission enhancement. The mechanical strain is measured by Raman spectroscopy, strain gauge, and analyzed by the finite element method.</jats:p> Electroluminescence from metal/oxide/strained-Si tunneling diodes Applied Physics Letters |
spellingShingle | Liao, M. H., Chen, M.-J., Chen, T. C., Wang, P.-L., Liu, C. W., Applied Physics Letters, Electroluminescence from metal/oxide/strained-Si tunneling diodes, Physics and Astronomy (miscellaneous) |
title | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_full | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_fullStr | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_full_unstemmed | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_short | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
title_sort | electroluminescence from metal/oxide/strained-si tunneling diodes |
title_unstemmed | Electroluminescence from metal/oxide/strained-Si tunneling diodes |
topic | Physics and Astronomy (miscellaneous) |
url | http://dx.doi.org/10.1063/1.1937989 |